000			01322cam a2200313 a 4500
999			_c459 _d459
001			4994081
003			OSt
005			20230621113033.0
008			990216s1999 nyua 001 0 eng
010			_a 99014252
020			_a0471534781 (alk. paper)
040			_aDLC _cDLC _dDLC
050	0	0	_aTP155.7 _b.F44 2000
082	0	0	_a660/.28 _221
100	1		_aFelder, Richard M., _d1939-
245	1	0	_aElementary principles of chemical processes / _cRichard M. Felder, Ronald W. Rousseau.
250			_a3rd ed.
260			_aNew York : _bJohn Wiley, _c2000.
300			_axxvi, 675 p. : _bill. ; _c26 cm. + _e1 computer laser optical disc (4 3/4 in.)
504			_aIncludes index.
650		0	_aChemical processes.
700	1		_aRousseau, Ronald W., _d1943-
856	4	2	_3Contributor biographical information _uhttp://www.loc.gov/catdir/bios/wiley041/99014252.html
856	4	2	_3Publisher description _uhttp://www.loc.gov/catdir/description/wiley032/99014252.html
856	4		_3Table of Contents _uhttp://www.loc.gov/catdir/toc/onix03/99014252.html
906			_a7 _bcbc _corignew _d1 _eocip _f19 _gy-gencatlg
942			_2lcc _cGENERAL